ISMN-CNR, Area della Ricerca di Bologna, Italy
Microfluidic devices for generating gradients and flat patterns of different cues on the surfaces
The idea of this activity is to exploit the long standing experience of the ISMN-CNR group in the field of microfluidics, dewetting and micro- and nano-patterning for functionalizing the surfaces in order to have the cues distributed, not in an homogeneus way, but according to gradient profiles. This issue is central to several different applications lab-on-a-chip:
Flat patterns based on the lithographic processes in combination with dewetting processes will be as well fabricated; in particular Lithographically Controlled Wetting (LCW) will be used to locally position anchoring points for molecules that will be required for the integrated device (active proteins or grafting sites).
WG1: Integrated Microfluidic Photonics